Subtractive & Mold Applications
- Deep etching of silicon, such as Bosch Process, glass and polymers
- Embossing mold for silicone imprints
Additive Applications
- High aspect ratio plating for the fabrication of bumps for flip-chip packaging, multi-chip modules, MEMS, sensors, thin-film magnetic heads

Copper coil plated with NR26-12000P mask after resist removal.
Metal (Cu) Thickness = 25µm
Photoresist = Futurrex NR26-12000P

Applications
- Replacement for positive resists in RIE process and general etch applications

Futurrex NR5-8000, 4.5:1 AR
Example of resist resolution
Film thickness: 54µm
Mask dimension: 12µm line/space
Exposure dose: 1100 mJ/cm².
Focus offset: -15µm.
Exposure tool: Ultratech Stepper Saturn
Model, i-line

Applications
- Facilitation of single-layer lift-off process to pattern metals and dielectrics without RIE
- Permanent components of devices (i.e. spacers, etc.)

Futurrex NR1-3000PY
Liftoff profile for Negative Resist
NR1-3000PY.
Photoresist Thickness = 3µm.

Resist Developers

Resist Developers
Alkaline Metal Containing RD3	TMAH Containing RD6

Applications
- Development of resist patterns
- Removal of Futurrex PC4-series temporary adhesive, protective and planarization coatings
Properties
- Water-based, basic solution
Impact on productivity
- Application of single developer for both positive and negative resists
- Elimination of solvents in the removal of PC4-series films
- Meet all REACH & international environmental standards

Metal-ion free developers:

Metal-ion free developers are applicable with both positive and negative resists.

Alkaline metal-based developers:

Alkaline metal-based developers are applicable with positive resists.