• Subtractive & Mold Applications
    • Deep etching of silicon, such as Bosch Process, glass and polymers
    • Embossing mold for silicone imprints
  • Additive Applications
    • High aspect ratio plating for the fabrication of bumps for flip-chip packaging, multi-chip modules, MEMS, sensors, thin-film magnetic heads

Copper coil plated with NR4-8000P mask after resist removal.
Metal (Cu) Thickness = 25µm
Photoresist = Futurrex NR4-8000P


  • Applications
    • Replacement for positive resists in RIE process and general etch applications

Futurrex NR5-8000, 4.5:1 AR
Example of resist resolution
Film thickness: 54µm
Mask dimension: 12µm line/space
Exposure dose: 1100 mJ/cm2.
Focus offset: -15µm.
Exposure tool: Ultratech Stepper Saturn
Model, i-line


  • Applications
    • Facilitation of single-layer lift-off process to pattern metals and dielectrics without RIE
    • Permanent components of devices (i.e. spacers, etc.)

Futurrex NR1-3000PY
Liftoff profile for Negative Resist
NR1-3000PY.
Photoresist Thickness = 3µm.


Graphic Arts

For over 20 years Futurrex has been providing the graphic arts industries with chemical products used for printing and lithographic technologies allowing the industry to achieve higher resolution end products for ever decreasing costs as the industry matures. Our positive and negative resists enable processes related to embossing and engraving.

Products used for this type of fabrication include:

  • PR1-series positive resists for etch applications applied via spray or roller coating.
  • NR9-series enhanced adhesion negative resists applied via spray or roller coating.
  • SC-series staging coatings for graphic arts applied via marker or brush.